Sio2 Targets

Descriptions of Sio2 Targets (Silicon Dioxide Sputtering Targets):
1. Sio2 targets fall into a variety of categories, including grain, wafer, disc, panel, plate, ring and block.
2. Our Sio2 targets have high purity (containing Sio2 from 99.95%-99.9999%), low air bubble density, and low impurity content.
3. Big dimension design can be fulfilled.
4. This kind of optical fused quartz product is widely used for coating, semiconductor, optics, environment protection and new energy resource industries.

Coating Materials:
Coating materials are widely applied in a thin film to provide protection or decoration functions to a surface. Compared with workpiece, most films are relatively thinner. In order to achieve the desired characteristics from the thin film, we must carefully consider the coating material formulation with regard to the part characteristics, surface preparation, application technique and curing meth.

Technical Information of Sio2 Targets:
Hints on evaporation: Evaporation with electron beam gun.
Evaporation temperature: 1700 ℃
Evaporation pressure: 5×10^-3Pa
Main Applications: Multi-layer coatings, filters, anti-reflection coatings, beam splitters, films for capacitors and etc.

ZCQ has a vast line of Sio2 targets products, including:
Sio2 Plate, Sio2 Ring, Sio2 Block, Sio2 Grain.

10 years of experience, coupled with quality products and superior services, has established ZCQ as a renowned Sio2 targets manufacturer in China.